6 or 8-arm glove box. Two (2) 6” antechambers, one (1) 12” antechamber. Vacuum chamber for combinatorial sputtering (Chamber 1) with very short target-substrate distance (1” achievable target-substrate distance). Within Chamber 1, three (3) 2” magnetrons with additional ports to add more later. Magnetrons must be moveable, slidable and able to tilt; ex situ is acceptable; manual tilt is acceptable. Target-substrate distance must reach 1” or smaller. Within Chamber 1, two (2) radio frequency power supplies to operate magnetrons, and space for a third to be added later. Within Chamber 1, capability for depositing on a stationary substrate during combinatorial synthesis to create composition gradient samples, and a rotating substrate once compositions of interest have been identified. Chamber 1 bolted to the back of the glove box for air sensitive targets and films. Within Chamber 1, substrate heater capable of reaching 800C minimum. Within Chamber 1, mass flow controllers for oxygen, nitrogen, argon process gases. Within Chamber 1, 2” minimum substrate stage with rotation capability. A second vacuum chamber bolted to the same glovebox with thermal evaporation capabilities for electrode deposition without air exposure (Chamber 2). This chamber is expected to be significantly smaller. Within Chamber 2, minimum of two (2) evaporation boats (for sodium and lithium) required, four (4) boats preferred. Within Chamber 2, quartz Crystal Microbalance to monitor deposition rate. Both chambers must be designed in such a way for easy reach and manipulation of source material, substrates, magnetron covers, boats, etc. through the glovebox. All vacuum pumps for both chambers and gloveboxes must be included. Standard software and automation. Installation by company and extensive user support.
