LSU Physics and Astronomy requires an Excimer laser together with a beamline associated to this excimer laser. The excimer laser and beamline will be used for the epitaxial growth of thin films by using existing pulsed laser deposition (PLD) chamber. Equipment must include the following specifications for the excimer laser and details of the beamline optics: A. Excimer laser 1. A COMPex 201excimer laser (or equivalent) with these specifications: a. Operating gas type: KrF b. Wavelength: 248 nm c. Max. energy: 750 mJ d. Max. power: 7.5 W e. Max. repetition rate: 10 Hz 2. The excimer laser unit must have these main features: a. Integrated energy monitor and energy stability better than 0.75% (1 sigma) at 248 nm, b. Operation through the standard LASCONTROL software, c. Ultimate Pulse Control (UPC) and energy control at the single pulse level, d. Integrated burst generator for complex pulse patterns and system parameter logging, e. It must also have excimer gas installation and be compatible with electrical power of 100–120/200–240 VAC; 50/60 Hz power (single phase) B. Customized PLD beam line The customized beamline of the excimer laser must have these specifications and main features: 1. The beamline must be laser class 1 conform, 2. The supplier must provide a customized adaptor flange to connect the laser to the chamber CF100 with optimized CF63 nipple,
