The focus of research on this project is to create very small (<100 nm) electronic, optoelectronic devices and quantum materials for space and national security applications. Ellipsometry is an essential instrument to measure the film thickness, optical constants for light reflecting and transparent materials. It is an indispensable instrument for the Nanofoundry to perform research in optical and semiconductor coatings. The system we want to purchase should meet the following minimum criteria: 1- Spectroscopic ellipsometry with variable angle measurements 2- Can measure the wavelengths ranging from 193 nm to 1700 nm with NIR upgradable in the system 3- Minimum data acquisition time approximately 0.3 secs and typical data acquisitions time 1-5 secs 4- Collimated light beams and automated sample translation with 4-inch wafer capabilities 5- Have the capability of variable angle transmission stage 6- Automated sample height alignment 7- Camera to view the sample with at least 3Mpixel CMOS sensor camera, lens set and field of view 2.1×1.6 mm. 8- 1-day on-site training and installation
